Materials AnalysisMRL Materials Analysis and X-Ray Facility (MAX)

Surface Analysis
Thin Film Characterization
Vibrational Electronic and Emission Spectroscopy
X-ray Diffraction

This facility is oriented toward multiple-technique characterization of a variety of solid materials with regard to atomic structure; chemical bonding; elemental and chemical composition of surfaces and interfaces; topographic, magnetic and piezoelectric characteristics of surfaces; and thickness and optical constants of thin films.


Electron microscopyMRL Electron Microscopy (EM) Facility

*Electron Microscopy* (EM) facility allows the researcher to form images of thin slices or nano particles of samples at a resolution of down to 0.14 nm (lattice resolution). Crystal structure may be analyzed by means of electron diffraction, and chemical analysis, with a sensitivity (in ideal cases) of a few atoms and spatial resolution (again, in ideal cases) of about 0.5nm, may be performed by energy-dispersive X-ray spectroscopy (EDS) analysis or electron energy-loss spectroscopy (EELS) analysis.






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